Laboratory Small PLC Controlled Three-Target Plasma Sputter

Product Details
Customization: Available
Certification: CE
Dimension(L*W*H): 440mm*330mm*300mm

360° Virtual Tour

Diamond Member Since 2015

Suppliers with verified business licenses

Audited Supplier

Audited by an independent third-party inspection agency

Year of Establishment
2011-12-26
Management System Certification
ISO 9001, ISO 9000, ISO 13485
  • Laboratory Small PLC Controlled Three-Target Plasma Sputter
  • Laboratory Small PLC Controlled Three-Target Plasma Sputter
Find Similar Products

Basic Info.

Model NO.
MC-PS-16-SM
Overall Dimensions
440mm*330mm*300mm
Equipment Name
Small PVD Coating Machine Gold
Color
White
Power(W)
2000W
Weight
50kg
Input Voltage
110/220VAC Switchable
Target Size
50 mm Dia. X (0.1 - 3) mm,Thickness
Ultimate Vacuum Pr
Built in Kf25 Vacuum Port
Keywords
Plasma Sputtering Coater Machine
Transport Package
Export Standard Packaging for Air and Sea
Trademark
MeCan
Origin
China (Mainland) Guangdong
Production Capacity
5000

Product Description

Laboratory small PLC controlled three-target plasma sputter   MC-PS-16-SM

Laboratory Small PLC Controlled Three-Target Plasma Sputter
Product Description

High Power Desktop Magnetron Plasma Sputtering Coater with a water cold  2"  target head , water chiller and rotatable sample holder, which is designed for coating all metallic films, including Zn, Al, Ti light metallic film  at affordable cost. One Aluminium  target  is included for immediate use.

nput Voltage 108/220VAC switchable
Output Power 1600VDC /250W /50mA max /Built-in over current (>150mA) protection
Specimen chamber Quartz glass tube, 167mm OD. x 152mm ID x 260mm Height
Sputtering Head 

2" flexible magnetron sputtering head with water cooling jacket is

included (Fig.1)

Specimen stage One 50 mm Dia stainless steel sample stage is rotatable from 0 - 5 RPM
  One manually operated shutter for target protection. (Fig.2)
 

Sputtering head holder is available for holding sputtering head while non-operation. The distance between the sputtering head and sample stage 

is adjustable from 60 - 100 mm.

  Max Coating area: 4" diameter max. 
 

One Air Cold Recirculating Water Chiller 10 L/min Flow is included for 

cooling sputtering head. (Fig.6)

Control Panel

 6" color  touch-screen control panel with PLC integration for easy 

operation One panel for all parameters monitor and 

control: vacuum, current.

Ultimate 

Vacuum Pressure

1.Built-in KF25 vacuum port
2.The system requires an Ar gas tank with pressure regulator. (not included)

3.< 1.0E-2 Torr by Vane vacuum pump (not included) for Au, Ag, Pt, Cu, 

Mo targets (not sensitive to air)

4.< 1.0E-5 Torr by Turbomolecular pump (not included) for Al, Mg, Li, Lr, Ti, Zn 

targets (sensitive to air)

5.The lowest vacuum may reach < 4.0E-6 Torr by pumping overnight and baking
Gas Atmosphere One needle valve installed to allow Ar gas inlet to achieve better plasma coating.
The system requires an Ar gas tank with pressure regulator (not included)
Target Target size: 50 mm dia. x (0.1 - 3) mm,thickness
One 2"  Aluminium target  is included

Also can coat Ag, Al, Cr, Ni, Pt, Ti, Sn, Mg, etc.  These targets are 

available upon request.

Aluminum Target Recommend Coating Method

Optional Film 

Thickness Monitor

 Target size: 50 mm dia. x (0.1 - 3) mm,thickness
One 2"  Aluminium target  is included

Also can coat Ag, Al, Cr, Ni, Pt, Ti, Sn, Mg, etc.  These targets are 

available upon request.

Aluminum Target Recommend Coating Method
Overall Dimensions  L 440mm×W 330mm × H 300mm without sputtering head
Warranty & Certificate One year limited with lifetime support  CE certified

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now
Contact Supplier
Product Groups
More